We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for ALD Equipment.
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ALD Equipment Product List and Ranking from 5 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Jun 03, 2026～Jun 30, 2026
This ranking is based on the number of page views on our site.

ALD Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Jun 03, 2026～Jun 30, 2026
This ranking is based on the number of page views on our site.

  1. Beneq Kanagawa//Industrial Machinery
  2. ワッティー Tokyo//Industrial Electrical Equipment
  3. ハイテック・システムズ Kanagawa//Industrial Machinery
  4. 4 Creative Coatings Co., Ltd. Tokyo//Electronic Components and Semiconductors
  5. 5 グローバルインフォメーション Kanagawa//Service Industry
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ALD Equipment Product ranking

Last Updated： Aggregation Period:Jun 03, 2026～Jun 30, 2026
This ranking is based on the number of page views on our site.

  1. ALD (Atomic Layer Deposition) device ワッティー
  2. ALD device Beneq TFS 500 Beneq
  3. Plasma/Thermal ALD equipment 'Fiji G2' ハイテック・システムズ
  4. ALD device Beneq TFS 200 Beneq
  5. 4 Creative Coatings "Vapor Technology" Creative Coatings Co., Ltd.

ALD Equipment Product List

1～6 item / All 6 items

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ALD (Atomic Layer Deposition) device

ALD (Atomic Layer Deposition) device

Reduction of maintenance load and compactization of volume achieved by a double-structured chamber. Our thermal solutions are consolidated to achieve optimal temperature management.

Equipment for experiments and research and development provided by Watty. We offer devices ranging from 2-inch to 8-inch models to meet user needs. Additionally, we provide various optional ancillary equipment to reduce the burden of equipment installation for our customers. We can accommodate customization requests for all aspects, including safety specifications, the number of precursors, precursor introduction methods, and exhaust systems. *For more details, please refer to the PDF materials or feel free to contact us. ▼ Contact Information TEL: Sagamihara Office 042-704-5352 MAIL: info@watty.co.jp

  • Processing Contract
  • Other surface treatment equipment
  • ALD Equipment

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Plasma/Thermal ALD equipment 'Fiji G2'

Plasma/Thermal ALD equipment 'Fiji G2'

500℃ wafer stage! Adoption of a remote ICP source with no plasma damage.

The "Fiji G2" is a research and development ALD system that utilizes thermal and plasma methods. It employs an ICP remote plasma source and features a vacuum load lock for substrate transport, designed to produce high-quality ALD films of oxide, nitride, and metal layers. Additionally, it comes standard with a simple exhaust unit, the ALD Shield Vapor Trap, and can accommodate up to 6 plasma gas lines. 【Features】 ■ 500°C wafer stage ■ Remote ICP source with no plasma damage ■ Mode supporting ultra-high aspect ratios (<2000:1) (thermal) ■ Plasma gas lines: up to 6 lines ■ Precursor lines: up to 6 lines *For more details, please refer to the PDF document or feel free to contact us.

  • Other semiconductor manufacturing equipment
  • ALD Equipment

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Creative Coatings "Vapor Technology"

Creative Coatings "Vapor Technology"

We will introduce the technologies and processing examples we propose based on the work material, film type, and film thickness!

"Vapor phase technology" is utilized in various fields such as 'new materials and substances' and 'energy' including resin raw materials and fuel cells, as well as in 'medical and healthcare' applications like medical sensors and devices, and in 'mobile devices', 'wearable devices', and 'automotive' sectors including electronic components and new displays. Additionally, it achieves film formation in the range of 1nm to 1000nm with diverse processes, film thicknesses, and types. Coating is performed using deposition methods such as evaporation, CVD, ALD, and sputtering. 【Features】 ■ ALD Robot CVA series Enables high-quality film formation at low temperatures, which is considered difficult in ALD. ■ Barrel-type ALD Robot CVA-B series A fusion of low-temperature ALD equipment and barrel mechanism. ■ Low-temperature high-frequency excitation DLC film formation device CVC series Allows for good adhesion film formation from graphite to DLC at low temperatures. ■ Bubbling CVD Robot CVB series Liquid to gas Enables low-cost and high-quality film formation at low temperatures. ■ IBAD (Ion Beam Assisted Deposition) CVI series Examples of contract film formation using IBAD Allows for low-energy irradiation at low temperatures, improving the adhesion of transparent conductive films (Zn O) and high-melting-point metal electrode formation for touch panels.

  • Contract manufacturing
  • ALD Equipment

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ALD device Beneq TFS 200

ALD device Beneq TFS 200

ALD equipment for research and development that grows together.

The "Beneq TFS 200" is a highly flexible ALD research platform suitable for academic research and corporate R&D. It is specially designed to minimize cross-contamination that can occur in multi-user research environments. Additionally, it provides technological solutions that enable high-quality film deposition on wafers, flat objects, particles, porous bulk materials, and complex three-dimensional objects characterized by very high aspect ratios. 【Products Offered (Partial)】 ■ 3D and batch production ■ Research equipment ■ Semiconductor devices ■ Spatial ALD devices *For more details, please download the PDF or feel free to contact us.

  • Company：Beneq
  • Price：Other
  • Other inspection equipment and devices
  • Other semiconductor manufacturing equipment
  • ALD Equipment

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ALD device Beneq TFS 500

ALD device Beneq TFS 500

Platform for ALD research and batch production.

The "Beneq TFS 500" is suitable for various applications in thin film deposition and is an ideal tool for multi-project environments. Equipped with a manual load lock, it enhances wafer processing capabilities. Different types of reaction chambers can be installed inside the vacuum chamber, allowing each reaction chamber to be optimized according to the customer's needs. Additionally, it can meet both the stringent requirements for industrial reliability and the need for flexibility in R&D operations. The process components ensure the availability of spare parts. 【Products and Services Offered】 ■ 3D and batch production ■ Research equipment ■ Coating services ■ Research and development services *For more details, please download the PDF or feel free to contact us.

  • Company：Beneq
  • Price：Other
  • Other inspection equipment and devices
  • Other semiconductor manufacturing equipment
  • ALD Equipment

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[English Market Research Report] Global Market for ALD Equipment

[English Market Research Report] Global Market for ALD Equipment

"Free samples" are currently available! Please check the application method from the [PDF download] button, or apply directly from the related links.

The global market size for ALD equipment is expected to reach 3.9 billion USD in 2023 and 6.2 billion USD by 2028, with a projected CAGR of 10.0% from 2023 to 2028. This report investigates and analyzes the global ALD equipment market, providing information on key driving and restraining factors, competitive landscape, and future trends.

  • Other services
  • ALD Equipment

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